Gold Sputter Targets

Spare targets are available for most well-known makes of sputter coaters. Typically, foil or disc targets are used, although some older instruments utilize solid plated targets.

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A variety of other metals are also available in specific sizes, upon request. Do inquire for further details.

Coater Types

Type 4: Polaron/Quorum/Bio-Rad/VG/Emitech - SC500, SC500A
Type 5: Polaron/Quorum/Bio-Rad/VG/Emitech - K550X, K650X
Type 7: Polaron/Quorum/Bio-Rad/VG/Emscope - K1250X, SP2000
Type 8: Polaron/Quorum/Bio-Rad/VG/Emitech - SC650, SC650A

Aluminum Nitride Sputtering Targets

ALUMINUM NITRIDE SPUTTERING TARGETS

Product Name: ALUMINUM NITRIDE SPUTTERING TARGETS

Product Code: NCZ-VA-203/21

CAS No: 24304-00-5

Particle Size: Inquire

Formula: AlN 40.99

Form: Sputtering Targets

Purity: 99.5-99.9%

Melting Point: 2200°C / 3992°F. For more product information, Acetron contains the details you need.

Density: 3.26 g/cm³

Composition: Al – 65.8%, N – 34.2%

Crystal Structure: Hexagonal

Descriptions: Aluminum Nitride Sputtering Targets

NANOCHEMAZONE specializes in producing high purity Aluminium Nitride Sputtering Targets with the highest possible density and the finest average grain sizes. These are ideal for semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) applications. Our standard sputtering targets for thin films are available as monoblocks or bonded with planar target dimensions, configurations up to 820 mm, and custom features such as hole drill locations, threading, bevelling, grooves, and backing designed to work with both older devices and the latest processing equipment.

We also produce research-sized targets and custom sizes and alloys. All targets are analyzed using advanced techniques such as X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP). "Sputtering" facilitates thin film deposition of ultra-high purity sputtering metallic or oxide materials onto another solid substrate by controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment.

Materials are produced using crystallization, solid-state, and other ultra-high purification processes such as sublimation. NANOCHEMAZONE excels in producing custom compositions for commercial, research applications, and new proprietary technologies, as well as casting any of the rare earth metals and other advanced materials into rods, bars, plates, or other machined shapes.

Storage Conditions

Store in an airtight sealed container, avoid exposure to light, and keep dry at room temperature.

Please contact us for customization and price inquiries: contact@nanochemazone.com

Note: We offer different size ranges of Nano and micron materials to meet clients' specific needs and accept customization in various parameters.

If you are looking for more details, kindly visit sputtering target materials.